METHOD OF PRODUCING POLYMERIC COMPOUND, POLYMERIC COMPOUND PRODUCED BY THE METHOD, POSITIVE PHOTOSENSITIVE COMPOSITION CONTAINING THE POLYMERIC COMPOUND, AND METHOD OF FORMING PATTERN USING THE POSITIVE PHOTOSENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a polymeric compound for use in fine pattern formation such as semiconductor production, having higher sensitivity than that of the conventional compound, and being improved in the pattern collapse; a polymeric compound produced by the method; a positive photosensitive composition containing the polymeric compound; and a method of forming a pattern using the positive photosensitive composition.;SOLUTION: The method of producing the polymeric compound comprising polymerizing a polymerizable compound having an ethylenic double bond using a chain transfer agent of a specific structure and a polymerization initiator is characterized in that the addition molar ratio (I/S) of the specifically structured chain transfer agent (S) to the polymerization initiator (I) is not greater than 1.0. The polymeric compound produced by the method, the positive photosensitive composition containing the polymeric compound, and the method of forming a pattern using the positive photosensitive composition are also provided.;COPYRIGHT: (C)2008,JPO&INPIT