首页> 外国专利> LASER WAVELENGTH CONTROLLER, GAS CONCENTRATION MEASURING DEVICE, LASER WAVELENGTH CONTROL METHOD, AND GAS CONCENTRATION MEASURING METHOD

LASER WAVELENGTH CONTROLLER, GAS CONCENTRATION MEASURING DEVICE, LASER WAVELENGTH CONTROL METHOD, AND GAS CONCENTRATION MEASURING METHOD

机译:激光波长控制器,气体浓度测量装置,激光波长控制方法和气体浓度测量方法

摘要

PROBLEM TO BE SOLVED: To accurately match the absorption wavelength of gas with the emission wavelength of semiconductor laser without depending on measuring environment.;SOLUTION: Laser light with modulated frequency is branched to a gas cell 44, and after it passes through the gas cell 44, it enters an optical detection part 45 on the sending side. An amplification ratio between the fundamental wave component and the doubled wave component of the laser light passing the gas cell 44 is calculated by a sending part substrate 54, and the temperature of the semiconductor laser 41 is so set that the wavelength of the laser light emitted from the semiconductor laser 41 may be matched with the absorption peak wavelength of the gas cell 44. Furthermore, wavelength modulation is conducted referring to a wavelength shifted from the absorption peak wavelength as reference, and the driving current of the semiconductor laser 41 is controlled at the same time. Thus, the absorption wavelength of the gas cell 44 is matched with the emission wavelength of the semiconductor laser 41.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:在不依赖于测量环境的情况下,使气体的吸收波长与半导体激光器的发射波长精确匹配。;解决方案:具有调制频率的激光被分支到气室44,并且在其穿过该气室之后如图44所示,其进入发送侧的光学检测部45。通过发送部基板54,计算通过气室44的激光的基波成分和双波成分之间的放大率,并设定半导体激光器41的温度以使发出的激光的波长来自半导体激光器41的来自半导体激光器41的驱动电流可以与气室44的吸收峰波长匹配。此外,参考从吸收峰波长偏移的波长作为参考进行波长调制,并且将半导体激光器41的驱动电流控制在同一时间。因此,气室44的吸收波长与半导体激光器41的发射波长匹配。;版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2008177262A

    专利类型

  • 公开/公告日2008-07-31

    原文格式PDF

  • 申请/专利权人 FUJI ELECTRIC SYSTEMS CO LTD;

    申请/专利号JP20070007830

  • 发明设计人 HIRAYAMA NORITOMO;

    申请日2007-01-17

  • 分类号H01S5/06;G01N21/39;

  • 国家 JP

  • 入库时间 2022-08-21 20:22:46

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