COATING COMPOSITION FOR FORMING HIGHLY DIELECTRIC THIN FILM, ITS PREPARATION METHOD AND HIGHLY DIELECTRIC FILM FORMED USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently preparing a coating composition for forming a highly dielectric thin film, which yields a uniform coating film due to an increased wettability, yields a smooth film surface due to a moderate viscosity, achieves an improved handleability due to a moderate drying speed and an improved productivity for forming a thick film due to the increased wettability and viscosity and is capable of forming a dielectric thin film which does not crack, shows little shrinkage and is excellent in dielectric characteristics.;SOLUTION: The method comprises a step of preparing an organic acid salt solution (A) of an alkaline earth metal element using a specific solvent mixture under a specific condition, a step of preparing an alkoxide solution (B) of at least one element chosen from the group consisting of titanium, tin and zirconium using a specific organic solvent under a specific condition, a step of synthesizing a composite organic acid salt solution (C) using the organic acid salt solution (A) and the alkoxide solution (B) under a specific condition and a step of adjusting the metal concentration using a diluent of a specific composition.;COPYRIGHT: (C)2008,JPO&INPIT