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LASER APPARATUS, LIGHT IRRADIATION APPARATUS AND EXPOSURE APPARATUS, PHOTOPRODUCTION METHOD, EXPOSING METHOD AND PRODUCTION METHOD OF DEVICE

机译:激光装置,光照射装置和曝光装置,光生产方法,装置的曝光方法和生产方法

摘要

PROBLEM TO BE SOLVED: To provide a pulse laser light of a predetermined wavelength having a thorough repetition frequency in which the spectrum width (wavelength width) has been caused to be a narrowband.;SOLUTION: The wavelength width of a pulse laser light LB having a predetermined wavelength irradiated from a solid laser apparatus 16 is substantially narrowed by a regulator 17. As the result, the wavelength width of the pulse laser light approaches a wavelength width to be satisfied in terms of causing the spectrum to be narrowband. Then, the pulse laser light is irradiated into a gas laser chamber 18 as a seed light and is amplified. As the result, a pulse laser light of a predetermined wavelength having a thorough repetition frequency in which the spectrum width (wavelength width) has been caused to be a narrowband at a required level is irradiated out of the gas laser chamber 18.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供具有彻底重复频率的预定波长的脉冲激光,在该重复频率中,光谱宽度(波长宽度)已成为窄带。;解决方案:具有以下特征的脉冲激光LB的波长宽度为:从固体激光器装置16发射的预定波长被调节器17基本上变窄。结果,就使光谱成为窄带而言,脉冲激光的波长宽度接近要满足的波长宽度。然后,脉冲激光作为种子光照射到气体激光室18中并被放大。结果,从气体激光腔室18照射具有预定重复波长的预定波长的脉冲激光,该重复激光中的光谱宽度(波长宽度)已成为所需水平的窄带。 (C)2008,日本特许厅&INPIT

著录项

  • 公开/公告号JP2008124318A

    专利类型

  • 公开/公告日2008-05-29

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20060307956

  • 发明设计人 YAMATO SOICHI;

    申请日2006-11-14

  • 分类号H01S3/10;H01S3/00;H01L21/027;G03F7/20;H01S3/06;H01S3/109;

  • 国家 JP

  • 入库时间 2022-08-21 20:22:18

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