From the assembly body of the spatter target and the bar king plate and

摘要

(57) Abstract Being production manner of the assembly body of the sputtering target and the backing plate, from the 1st material which possesses fixed coefficient of thermal expansion the target (16) the process which is formed and, from the material which differs from the 1st material which possesses the coefficient of thermal expansion which differs from the coefficient of thermal expansion of the 1st material the backing plate (12) from the 3rd material which possesses process and the fixed coefficient of thermal expansion which are formed block (20) process and the block which are formed on the aspect of one side of the backing plate distribution facilities process and the target which are done on the other aspect of the backing plate distribution facilities the process which is doneWith, the target, laying out the backing plate and block under the condition which rose temperature and pressure the target, the backing plate and block it possesses with the process mutually it diffuses junction. The 3rd material is the material which differs from the 2nd material, it is chosen from the material which possesses the coefficient of thermal expansion which is equal to the 1st material.