NON-CHEMICALLY-AMPLIFIED MAIN CHAIN DECOMPOSITION TYPE POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a non-chemically-amplified main chain decomposition type positive resist composition having good coating properties and capable of preventing intermixing with another organic layer.;SOLUTION: The non-chemically-amplified main chain decomposition type positive resist composition is obtained by dissolving a base resin component (A) of which the main chain is decomposed upon exposure to light to increase solubility in a developer in at least one organic solvent selected from ethyl lactate, methyl-3-methoxypropionate and γ-butyrolactone, wherein the base resin component (A) is preferably based on one or more selected from the group consisting of constitutional units represented by general formula (a-1) and constitutional units represented by general formula (a-2).;COPYRIGHT: (C)2008,JPO&INPIT