SUBSTRATE TREATING EQUIPMENT, ADJUSTMENT METHOD OF SUBSTRATE HANDOVER POSITION, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide substrate treatment equipment that is compact and can precisely align a substrate handover position, a method of substrate transfer position adjustment, and a storage medium storing this method.;SOLUTION: The substrate treatment equipment holds a substrate, such as a wafer W and the like, in a substrate holder for treatment, the substrate holder that is vertically freely rotatable like a spin chuck 2, wherein in lieu of the substrate, a jig 12 is transfered to the substrate holder to find centrifugal acceleration at a predetermined measuring position preset on this jig 12 and an eccentric distance from a rotation center of the spin chuck 2 to this measuring position. Further, based on the centrifugal acceleration and eccentric distance obtained from at least three different transfer positions, the above rotation center is found, and the position where the center of the substrate and the above rotation center agree is stored as data of the substrate's transfer position.;COPYRIGHT: (C)2008,JPO&INPIT