APPARATUS AND PROCESSING METHOD FOR GAS PROCESSING, APPARATUS AND METHOD FOR PROCESSING GAS HYDROGEN FLUORIDE GAS SUPPLY, METHOD THEREFOR, AND COMPUTER-READABLE STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a gas processing apparatus that is superior in reproducibility of process and capable of supplying hydrogen fluoride gas stably into a processing container over a long term.;SOLUTION: COR equipment 5 comprises a chamber 50 for containing a wafer W; a line 54b for supplying hydrogen; a line 55b for supplying fluorine; a mass flow controller 54c for regulating the flow rate of hydrogen that is flowing through the hydrogen supply line 54b; a mass flow controller 55c for regulating the flow rate of fluorine flowing through the fluorine supply line 55b; a reaction container 62, connected to the hydrogen supply line 54b and the fluorine supply line 55b and producing hydrogen fluoride gas, by causing reaction of hydrogen supplied by the hydrogen supply line 54b and fluorine supplied by the fluorine supply line 55b; and a line 61 for supplying hydrogen fluoride gas, produced in the reaction container 62 to the chamber 50.;COPYRIGHT: (C)2008,JPO&INPIT