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The switched connection film the reluctance effective component and the magnetic memory null 20 which use

机译:所使用的开关连接膜的磁阻有效成分和磁存储器无效20

摘要

PPROBLEM TO BE SOLVED: To stably obtain an adequate exchange-coupling force at room temperature and in a high temperature range by stabilizing the film composition and the film quality of an antiferromagnetic film which is composed of an Mn alloy and is excellent in corrosion resistivity and thermal property. PSOLUTION: The antiferromagnetic film contains Mn of 20 to 95 atomic per cent, while the remainder is substantially at least one of R element selected from among Ni, Pd, Pt, Co, Rh, Ir, V, Nb, Ta, Cu, Ag, Au, Ru, Os, Cr, Mo, W, and Re. The antiferromagnetic film comprises at least one member selected from among an alloy phase and a compound phase formed between the R element and Mn, and is formed by sputtering using a sputtering target in which no single-phase Mn grain having the maximum grain size exceeding 50 μm exists. The divergence of the composition of the antiferromagnetic film from that of the sputtering target is less than 10 atomic per cent. The antiferromagnetic film 3 is laminated with a ferromagnetic film 4 to constitute the exchange-coupling film 2. PCOPYRIGHT: (C)2006,JPO&NCIPI
机译:

要解决的问题:通过稳定膜组成和由Mn合金组成的,优异的反铁磁膜的膜质量,来稳定地在室温和高温范围内获得足够的交换耦合力。耐腐蚀性和热性能。

解决方案:反铁磁膜包含20%到95%原子百分比的Mn,而其余基本上是选自Ni,Pd,Pt,Co,Rh,Ir,V,Nb,Ta, Cu,Ag,Au,Ru,Os,Cr,Mo,W和Re反铁磁膜包含选自在R元素和Mn之间形成的合金相和化合物相中的至少一种,并且通过使用溅射靶通过溅射形成,其中最大晶粒尺寸不超过50的单相Mn晶粒不存在。存在。反铁磁膜的成分与溅射靶的成分的偏差小于10原子%。将反铁磁膜3与铁磁膜4层压以构成交换耦合膜2。

版权所有:(C)2006,JPO&NCIPI

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