首页>
外国专利>
Sinterring the Sb-Te based alloy powder and this powder for sinterring, production method of the sintered body sputtering target and the Sb-Te based alloy powder for sinterring which can
Sinterring the Sb-Te based alloy powder and this powder for sinterring, production method of the sintered body sputtering target and the Sb-Te based alloy powder for sinterring which can
Furthermore the machine pulverizing the gas atomization powder of the Sb-Te based alloy, sinterring the Sb-Te based alloy powder and this powder which for sinterring, feature that maximum grain size of the powder which can is 90 millimicrons or less maximum grain size of the powder is 90 millimicrons or less by the machine pulverizing in inactive atmosphere without it makes the atomization powder the sintered body sputtering target which can and after melting the Sb-Te based alloy, with gas atomization, furthermore, disclosing this to the atmosphere, the Sb-Te based alloy powder for the sintered body sputtering target which features that the powder which at the same time makes oxygen content decrease is producedProduction method. Uniformity and refinement of Sb-Te based alloy sputtering target organization are assured, crack initiation of the sinterring target is controlled, occurrence of akingu is prevented at the time of sputtering. In addition, unevenness of the surface by the spatter erosion is made to decrease, the Sb-Te based alloy sputtering target of satisfactory quality is obtained.
展开▼