Process for producing a graft pattern forming method, the graft pattern material, a lithography method, a conductive pattern forming method, a conductive pattern, a color filter, color filter, and a method of manufacturing a microlens

摘要

Patterning with high resolution is possible by using the exposure apparatus of the generic invention, repellent and oil repellent which is formed graft pattern forming method, the method which can be efficiently formed a water repellent region and oil repellent it is intended lithography method using the etching stopper aqueous graft pattern, the conductive pattern forming method using the graft pattern formed by the graft pattern forming method, a color filter forming method, and a micro lens manufacturing method. Is provided in a pattern of a compound having a substrate binding site photopolymerization initiation site on the surface of the substrate, capable of initiating radical polymerization by photocleavage, the graft pattern forming method has a functional group of the water-repellent and oil-repellent After contacting the radical-polymerizable compound, or performs overall exposure, is bound to a substrate compound having a substrate binding site with a polymerization initiation site which can initiate radical polymerization by photocleavage, repellent and oil repellent and characterized in that the contacting the radical-polymerizable compound having a functional group of the water, by either exposing the pattern to form a non-producing region and the graft polymer formation region. [Selection] Figure Figure 1