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ARRANGEMENT FOR GENERATING EXTREME ULTRAVIOLET RADIATION FROM A PLASMA GENERATED BY AN ENERGY BEAM WITH HIGH CONVERSION EFFICIENCY AND MINIMUM CONTAMINATION
ARRANGEMENT FOR GENERATING EXTREME ULTRAVIOLET RADIATION FROM A PLASMA GENERATED BY AN ENERGY BEAM WITH HIGH CONVERSION EFFICIENCY AND MINIMUM CONTAMINATION
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机译:由高转换效率和最小污染的能量束产生的等离子体产生极紫外辐射的布置
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摘要
The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device. According to the invention, this object is met by using a mixture of particles with a carrier gas and the target feed device has a gas liquefaction chamber, wherein the target material is supplied to the injection unit as a mixture of solid particles in liquefied carrier gas, and a droplet generator is provided for generating a defined droplet size and series of droplets, wherein means which are controllable in a frequency-dependent manner and which are triggered by the pulse frequency of the energy beam are connected to the injection unit for the series of droplets.
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