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METHOD AND APPARATUS FOR CONTROLLING COMPOSITION PROFILE OF COPPER INDIUM GALLIUM CHALCOGENIDE LAYERS
METHOD AND APPARATUS FOR CONTROLLING COMPOSITION PROFILE OF COPPER INDIUM GALLIUM CHALCOGENIDE LAYERS
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机译:铜铟镓硫合金层组成分布特征的控制方法和装置
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摘要
The present invention relates to method and apparatus for preparing thin films of semiconductor films for radiation detector and photovoltaic applications. In one aspect, the present invention is directed to a method of forming a Cu(In,Ga)(S,Se)2 layer with substantially uniform Ga distribution. In a particular aspect, the method includes depositing a precursor film on the base, the precursor film including Cu, In and Ga, sulfurizing the precursor film thus forming a sulfurized precursor layer with a substantially uniform Ga distribution, and selenizing the sulfurized precursor layer to reduce the sulfur concentration therein and obtain the Cu(In,Ga)(S,Se)2 layer with substantially uniform Ga distribution. In a further aspect, the method also includes the step of selenizing the precursor film.
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