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METHOD OF FORMING A DUAL DAMASCENE STRUCTURE UTILIZING A DEVELOPABLE ANTI-REFLECTIVE COATING
METHOD OF FORMING A DUAL DAMASCENE STRUCTURE UTILIZING A DEVELOPABLE ANTI-REFLECTIVE COATING
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机译:利用可发展的抗反光涂层形成双重镶嵌结构的方法
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摘要
A method of patterning a structure in a thin film on a substrate is described. A film stack on the substrate includes the thin film on the substrate, a developable anti-reflective coating (ARC) layer on the thin film, and a first photo-resist layer on the developable ARC layer. The first photo-resist layer and the developable ARC layer are imaged with a first image pattern and developed to form the first image pattern in the first photo-resist layer and the developable ARC layer. Thereafter, the first photo-resist layer is removed, and the developable ARC layer is modified by thermal treatment. A second photo-resist layer is then formed on the modified ARC layer, and the second photo-resist layer is imaged with a second image pattern and developed to form the second image pattern in the second photo-resist layer. The first and second image patterns are then transferred to the thin film.
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