首页> 外国专利> PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A RADIATION DETECTOR FOR SPATIALLY RESOLVED REGISTRATION OF ELECTROMAGNETIC RADIATION

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A RADIATION DETECTOR FOR SPATIALLY RESOLVED REGISTRATION OF ELECTROMAGNETIC RADIATION

机译:具有放射探测器的微成像投影投影工具,用于电磁辐射的空间分辨配准

摘要

A microlithography projection exposure tool with a radiation detector for the locally resolved recording of electromagnetic radiation. The radiation detector comprises: a solid state body which is configured to multiply electric charge and a collector which is configured to determine the location of the multiplied electric charge by means of charge division.
机译:一种带有辐射探测器的微光刻投影曝光工具,用于局部分辨记录电磁辐射。辐射探测器包括:固态主体,其被配置为使电荷相乘;以及收集器,其被配置为通过电荷划分来确定相乘的电荷的位置。

著录项

  • 公开/公告号US2008128643A1

    专利类型

  • 公开/公告日2008-06-05

    原文格式PDF

  • 申请/专利权人 ULRICH MUELLER;JOACHIM STUEHLER;

    申请/专利号US20070855328

  • 发明设计人 JOACHIM STUEHLER;ULRICH MUELLER;

    申请日2007-09-14

  • 分类号G01N21/86;

  • 国家 US

  • 入库时间 2022-08-21 20:13:28

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