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TRI-GATE DEVICE WITH CONFORMAL PVD WORKFUNCTION METAL ON ITS THREE-DIMENSIONAL BODY AND FABRICATION METHOD THEREOF
TRI-GATE DEVICE WITH CONFORMAL PVD WORKFUNCTION METAL ON ITS THREE-DIMENSIONAL BODY AND FABRICATION METHOD THEREOF
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机译:三维实体上具有共形PVD功能金属的三栅极器件及其制造方法
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摘要
A method of fabricating a tri-gate semiconductor device comprising a semiconductor body having an upper surface and side surfaces and a metal gate that has an approximately equal thickness on the upper and side surfaces. Embodiments of a tri-gate device with conformal physical vapor deposition workfunction metal on its three-dimensional body are described herein. Other embodiments may be described and claimed.
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