MASK PATTERN MATCHING METHOD AND MASK PATTERN MATCHING APPARATUS USING THE SAME

摘要

Mask pattern matching methods and apparatus are described. A mask pattern matching method comprises: presetting, in a measuring device, distinct tones of line and space of a mask circuit pattern, respectively; positioning a mask including an alignment mark on a stage; positioning the measuring device above the mask so as to be aligned with a position of the alignment mark, and setting a measurement region; distinguishing light and darkness of the line and space of a circuit pattern formed on the mask within the measurement region by the measuring device, based on the distinct tones; and matching a circuit pattern formed on the entire region of the mask by the measuring device, based on the distinct tones.