首页>
外国专利>
COMPENSATING FOR LAYOUT DIMENSION EFFECTS IN SEMICONDUCTOR DEVICE MODELING
COMPENSATING FOR LAYOUT DIMENSION EFFECTS IN SEMICONDUCTOR DEVICE MODELING
展开▼
机译:补偿半导体器件建模中的布局尺寸效应
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method includes receiving design data associated with an integrated circuit device. The integrated circuit device includes a first element having a corner defined therein and a second element overlapping the first element. A dimension specified for the first element in the design data is adjusted based on a distance between the second element and the corner. The integrated circuit device is simulated based on the adjusted dimension.
展开▼