首页> 外国专利> System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby

System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby

机译:形成用于压印光刻的纳米盘的系统和方法以及由此形成的纳米盘和存储盘

摘要

A system and method form a nanodisk that can be used to form isolated data bits on a memory disk. The imprint stamp is formed from first and second overlapping patterns, where the patterns are selectively etched. The selective etching leaves either pits or posts on the imprint stamp. The pits or posts are imprinted on the memory disk, leaving either pits or posts on the memory disk. The pits or posts on the memory disk are processed to form relatively small and dense isolated data bits. Instability of the isolated data bits caused by outside magnetic and thermal influences is substantially eliminated.
机译:一种系统和方法形成纳米盘,该纳米盘可用于在存储盘上形成隔离的数据位。压印印模由第一和第二重叠图案形成,其中图案被选择性地蚀刻。选择性蚀刻在压印印模上留下凹坑或柱子。凹坑或柱子都印在内存磁盘上,而凹坑或柱子则留在内存盘上。处理存储磁盘上的凹坑或柱以形成相对较小和密集的隔离数据位。基本上消除了由外部磁和热影响引起的隔离数据位的不稳定性。

著录项

  • 公开/公告号US7399422B2

    专利类型

  • 公开/公告日2008-07-15

    原文格式PDF

  • 申请/专利权人 HARRY SEWELL;

    申请/专利号US20050288135

  • 发明设计人 HARRY SEWELL;

    申请日2005-11-29

  • 分类号B44C1/22;C03C25/68;C23F1/00;

  • 国家 US

  • 入库时间 2022-08-21 20:11:31

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号