首页> 外国专利> High resolution direct-projection type x-ray microtomography system using synchrotron or laboratory-based x-ray source

High resolution direct-projection type x-ray microtomography system using synchrotron or laboratory-based x-ray source

机译:使用同步加速器或基于实验室的X射线源的高分辨率直接投影型X射线显微断层摄影系统

摘要

A projection-based x-ray imaging system combines projection magnification and optical magnification in order to ease constraints on source spot size, while improving imaging system footprint and efficiency. The system enables tomographic imaging of the sample especially in a proximity mode where the same is held in close proximity to the scintillator. In this case, a sample holder is provided that can rotate the sample. Further, a z-axis motion stage is also provided that is used to control distance between the sample and the scintillator.
机译:基于投影的X射线成像系统将投影放大率和光学放大率结合在一起,以减轻对光源光斑尺寸的限制,同时提高成像系统的占地面积和效率。该系统能够对样品进行断层成像,特别是在接近模式下,在该模式下将样品保持在紧邻闪烁体的位置。在这种情况下,提供了可以旋转样品的样品保持器。此外,还提供了一个z轴运动平台,该平台用于控制样品和闪烁体之间的距离。

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