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Method for supercritical carbon dioxide processing of fluoro-carbon films
Method for supercritical carbon dioxide processing of fluoro-carbon films
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机译:超临界二氧化碳处理氟碳薄膜的方法
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摘要
A method for treating a fluoro-carbon dielectric film for integration of the dielectric film into a semiconductor device. The method includes providing a substrate having a fluoro-carbon film deposited thereon, the film having an exposed surface containing contaminants, and treating the exposed surface with a supercritical carbon dioxide fluid to clean the exposed surface of the contaminants and provide surface termination. The supercritical carbon dioxide treatment improves adhesion and electrical properties of film structures containing a metal-containing film formed on the surface of the fluoro-carbon dielectric film.
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