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Method and apparatus for process control in time division multiplexed (TDM) etch processes
Method and apparatus for process control in time division multiplexed (TDM) etch processes
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机译:用于时分复用(TDM)蚀刻工艺中的工艺控制的方法和设备
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摘要
The present invention provides a method for controlling pressure in a chamber during a time division multiplexed process. A throttle valve is positioned based on an open-loop pressure control algorithm within at least one step of the time division multiplexed etch process. A pressure response of the step is evaluated and compared to a desired pressure response. The throttle valve is then positioned through a proportional, integral and derivative controller step to step of the time division multiplexed etch process based on the evaluation to the desired pressure response.
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