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Reduction of near field E-M scattering using high impedance coating materials

机译:使用高阻抗涂层材料减少近场E-M散射

摘要

The present invention selectively uses a high-impedance layer to reduce the effects of E-M scattering at metallic discontinuities. The high-impedance layer can be fabricated using a combination of metallic and resistive materials that are typically used in electro-static discharging (ESD) applications. A thin layer of metal can be deposited on the surface of a dielectric substrate such as polyethylene. This metallic layer can be on an inner, outer, or buried layer of the material. The metallic layer allows the RF induced currents to spread out over a designated surface area. A layer of resistive material can be applied to a similar dielectric layer. The resistive layer provides sufficient attenuation to decrease the RF surface waves and minimize electro-magnetic scattering on the printed circuit board (PCB). Furthermore, since the metallic and resistive materials can be applied in very thin layers, sufficient transparency can be preserved in desired areas such as the mobile phone's display region.
机译:本发明选择性地使用高阻抗层来减小金属不连续处的E-M散射的影响。可以使用通常在静电放电(ESD)应用中使用的金属和电阻材料的组合来制造高阻抗层。可以在诸如聚乙烯的介电基板的表面上沉积金属的薄层。该金属层可以在材料的内部,外部或掩埋层上。金属层允许RF感应电流在指定的表面积上散布。电阻材料层可以施加到类似的介电层上。电阻层可提供足够的衰减,以减小RF表面波并使印刷电路板(PCB)上的电磁散射最小化。此外,由于可以将金属和电阻材料涂在非常薄的层中,因此可以在所需区域(例如移动电话的显示区域)中保留足够的透明度。

著录项

  • 公开/公告号US7366554B2

    专利类型

  • 公开/公告日2008-04-29

    原文格式PDF

  • 申请/专利权人 GERARD JAMES HAYES;

    申请/专利号US20040710864

  • 发明设计人 GERARD JAMES HAYES;

    申请日2004-08-09

  • 分类号H04M1/00;

  • 国家 US

  • 入库时间 2022-08-21 20:09:49

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