Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method

摘要

Drawing-data creating method includes selecting charged beam drawing-apparatus dividing drawing area into main fields, subfields and unit fields (U-fields), dividing design data (D-data) corresponding to pattern drawn on area into first D-data corresponding to main fields, dividing first D-data into second D-data corresponding to subfields, dividing second D-data into third D-data corresponding to U-fields, evaluating resist resolution to predetermined dimension on U-fields, creating table relating U-fields to resolution based on result of evaluating the resolution, judging whether third D-data corresponds to data having the dimension and corresponds to pattern falling in U-field having rejectable resolution is based on the dimension and table, and converting data judged to correspond to the data among third D-data into first drawing-data after coordinate conversion so that the data fall in U-field having acceptable resolution, and converting data judged not to correspond to the data among third D-data into second drawing-data without coordinate conversion.