PROCESS FOR PRODUCING A THIN GLASSLIKE COATING ON SUBSTRATES FOR REDUCING GAS PERMEATION

摘要

oxysilyl)alky] radical, n being an integer or being calculated such that the polysilazane has a number-average molecular weight ranging from 150 to 150,000 g/mol, and b) a catalyst in an organic solvent, and then removing the solvent using evaporation such that a polysilazane layer having a thickness of 0.05 to 3.0 µm remains on the substrate, and irradiating the polysilazane layer with VUV radiation having wavelength portions 230 nm and UV radiation having wavelength portions ranging between 230 and 300 nm in an atmosphere containing steam in the presence of oxygen, active oxygen, and optional nitrogen.