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process for the production of bodies of porous silicon to form lenticular bodies of porous silicon avwenti form lenticular products by means of this method and use of them

机译:的方法,用于生产多孔硅体以形成双凸透镜体的方法通过使用该方法形成多孔硅体

摘要

Production of porous silicon bodies with a planoconvex or concavoconvex lens-shaped structure, comprises applying the lens-like photolacquer coat; transferring the shape of the lens-like photolacquer coat on to the silicon surface by etching process; masking the silicon surface; porosing the non-masked region of the silicon surface by applying of a current density (J1) for a time period (t1); and porosing the silicon material, which is adjacent to the porosified silicon by applying a various current density for different time period. Production of porous silicon bodies with a planoconvex or concavoconvex lens-shaped structure, comprises applying the lens-like photolacquer coat; transferring the shape of the lens-like photolacquer coat on to the silicon surface by etching process; masking the silicon surface; porosing the non-masked region of the silicon surface by applying of a current density (J1) for a time period (t1); porosing the silicon material, which is adjacent to the silicon that is porosified in the above by applying a current density (J2) for a time period (t2); porosing the silicon material, which is adjacent to the silicon that is porosified in the above step by applying a current density (J3) for a time period (t3); porosing the silicon material, which is adjacent to the silicon that is porosified in the above step by applying a current density (J4) for a time period (t4). An independent claim is included for a porous silicon body (14) with lens-shaped structure, comprising a first outer layer (7), an intermediate layer (8), and a second outer layer (9), which is produced by the process, where the pore channels (11), (12), (13) are arranged essentially perpendicular to the surface of the silicon body and the porosity of the intermediate layer is greater than the porosity of the first outer layer and the second outer layer.
机译:具有平凸或凹凸透镜形状的多孔硅体的制造包括:涂覆透镜状的光致抗蚀剂涂层。通过蚀刻工艺将透镜状的光漆涂层的形状转移到硅表面上;遮盖硅表面;通过施加电流密度(J1)一段时间(t1)来打孔硅表面的非掩蔽区域;通过在不同的时间段内施加不同的电流密度来使与多孔硅相邻的硅材料多孔。具有平凸或凹凸透镜形状的多孔硅体的制造包括:涂覆透镜状的光致抗蚀剂涂层。通过蚀刻工艺将透镜状的光漆涂层的形状转移到硅表面上;遮盖硅表面;通过施加电流密度(J1)一段时间(t1)来打孔硅表面的非掩蔽区域;通过施加一定时间(t2)的电流密度(J2),使与在上面被多孔化的硅相邻的硅材料多孔化;通过施加电流密度(J3)一段时间(t3),使与在上述步骤中被多孔化的硅相邻的硅材料多孔化。通过施加一段时间(t4)的电流密度(J4),对与在上述步骤中被多孔化的硅相邻的硅材料进行多孔化。包括具有透镜状结构的多孔硅体(14)的独立权利要求,其包括通过该方法生产的第一外层(7),中间层(8)和第二外层(9)。 ,其中孔通道(11),(12),(13)基本上垂直于硅体的表面布置,并且中间层的孔隙率大于第一外层和第二外层的孔隙率。

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