首页> 外国专利> Device for full extent of wavefront in arbitrary optical system of ophthalmic lenses and optical instruments for use in optical metrology, has principle measurement base for local determination of wavefront direction

Device for full extent of wavefront in arbitrary optical system of ophthalmic lenses and optical instruments for use in optical metrology, has principle measurement base for local determination of wavefront direction

机译:用于眼科镜片的任意光学系统中的全波前范围的装置以及用于光学计量学的光学仪器,具有用于局部确定波前方向的原理测量基础

摘要

The device has a principle measurement base for local determination of wavefront direction simultaneously in a series of continuous groups positions so that the complete set of positions intercepts completely to wavefront to be measured to make a thorough sampling of wavefront. An independent claim is also included for a method for full extent of wavefront in arbitrary optical system.
机译:该设备具有一个原理性的测量基础,可以在一系列连续的组位置中同时局部确定波前方向,从而使整套位置完全与要测量的波前相交,从而对波前进行全面采样。还包括针对任意光学系统中全部波前范围的方法的独立权利要求。

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