METHOD FOR CHARACTERISING A THIN-FILM DIELECTRIC MATERIAL IN THE FAR-INFRARED FIELD AND DEVICE AND TEST BENCH FOR REALISING SAID METHOD

摘要

The invention relates to a method and a device for characterising a thin film (2). The device (1) defining a wave guide includes a substrate (10) of a transparent material with parallel faces (100, 101) with a diffraction network (102) on one face (100). A wave parallel network THz is projected on the network (102) at a predetermined incidence angle and the energy transmitted is measured with or without a film (102) on the other face (101). The transmitted energy has minimal values for certain frequencies that differ depending on the film (2) being present or not. The differential analysis of the minimal values with and without the film (2) is used for determining the electromagnetic parameters of the film material.