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Modulation of exposure duration and/or power to achieve gray-scaling in maskless photolithography
Modulation of exposure duration and/or power to achieve gray-scaling in maskless photolithography
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机译:调制曝光时间和/或功率以实现无掩模光刻中的灰度
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摘要
In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
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