Depositing organic and/or inorganic nanolayers by plasma discharge

摘要

organic and / or inorganic nanoschichten (56) using plasmaentladung, in particular through the plasmaunterstu00fctzter chemical deposition from a gas and vapour phase in a hochvakuumreaktor (10) on a substrate (16) isolated.after the evacuation of the reactor (10), at least one element of the group consisting of at least one schichtbildenden monomer (38), a reaktivgas (40), and a carrier. inert gas, in the anregungszone (26) for the plasma (24) guided.at the same time, farbstoffmoleku00fcle (48) and / or submikrone farbstoffpigmente (50) into one of the anregungszone (26) for the plasma spatially separate from the anregungszone (26) of the diffusionszone (52) in the area of the substrate (16) and the led agglomerationsbildung nanoschicht (56) installed.the method is, in particular, the coating of optoelectronic components and textiles.