Quality surveillance of patterned, in particular spatially curvilinear surfaces

摘要

The method involves illuminating a surface by an illumination source (20) with a short wave optical radiation with wavelengths of 400 nanometers. The illuminated surface region is sensed by a line camera (18) which is sensitive in a short-wave optical radiation region, under bright and/or dark field conditions. The surface is moved in a transport direction and the camera is arranged transverse to the transport direction. Image signals obtained by the camera are analyzed on a computing unit on differences in comparison to an error-free surface. An independent claim is also included for an arrangement for inspecting colored patterned moved surfaces under bright and/or dark field conditions.