首页> 外国专利> CAPACITANCE TYPE DISPLACEMENT GAUGE AND METHOD FOR MEASURING DEFORMATION OF A SPECIMEN USING THE SAME

CAPACITANCE TYPE DISPLACEMENT GAUGE AND METHOD FOR MEASURING DEFORMATION OF A SPECIMEN USING THE SAME

机译:电容式位移规及使用该电容式位移规测量试样变形的方法

摘要

The present invention, relates to a method of measuring strain gauge and capacitive displacement using the same specimen, specimen , in particular, as in MEMS (Micro Electro-Mechanical Systems) can measure the variation of the thickness of the test piece used in the micrometer field device, has a high speed, also, provides the linearity of the measurements improved capacitance-type strain gauge that is that a technical problem. For ; this end, the present invention provides a capacitance type displacement gauge to measure the deformation of the specimen due to the applied load. Capacitance-type displacement gauge according to the present invention comprises a frame; The first and the second grip, which is installed on the frame to support the specimen; And a second and a third electrode facing the first electrode and the first electrode, the facing area and thus the capacitance of the second and the third electrode to the first electrode relative to the deformation of the specimen increased or decreased by an electrode unit.
机译:本发明涉及一种使用同一试样测量应变仪和电容位移的方法,特别是如在MEMS(Micro Electro-Mechanical Systems)中可以测量试样的千分尺厚度变化的方法现场设备,具有很高的速度,还提供了测量的线性度,改进了电容型应变仪,这是一个技术问题。为;为此,本发明提供了一种电容式位移计,以测量由于施加的载荷而引起的试样的变形。根据本发明的电容式位移计包括框架;和第一和第二手柄,安装在框架上以支撑样品;面对第一电极和第一电极的第二和第三电极,面对的面积以及第二和第三电极相对于样品的变形的相对电容通过电极单元增加或减小。

著录项

  • 公开/公告号KR100776391B1

    专利类型

  • 公开/公告日2007-11-16

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060013253

  • 发明设计人 이학주;송지호;김정엽;

    申请日2006-02-10

  • 分类号G01B7/16;

  • 国家 KR

  • 入库时间 2022-08-21 19:54:39

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