METHOD OF FORMING ELECTROCHROMIC LAYER PATTERN, METHOD OF MANUFACTURING ELECTROCHROMIC DEVICE USING THE SAME, AND ELECTROCHROMIC DEVICE INCLUDING ELECTROCHROMIC LAYER PATTERN

摘要

A method of forming electrochromic layer patterns, a method of manufacturing an electrochromic device using the same, and the electrochromic device including the electrochromic layer patterns are provided to increase a contacted area between an electrochromic layer and an ion conducting layer using laser interference lithography to improve coloring and discoloring speeds and to prevent the electrochromic layer from being damaged by using the electrochromic layer with an inorganic thin film. An electrochromic element comprises first and second transparent substrates(400), first and second transparent electrodes(410), electrochromic layer patterns, and ion conducting layers(470). The transparent electrodes, which are sheet-shaped, are formed on the transparent substrates respectively. The electrochromic layer patterns are transferred to at least one side of the electrodes through openings of photoresist patterns formed by laser interference lithography. The ion conducting layers fill spaces limited by the electrochromic layer patterns and the surfaces of the electrodes. The electrochromic layer patterns are formed by lift-up of the photoresist pattern after depositing the electrochromic layer patterns. The electrochromic layer is precluded from being damaged.