首页> 外国专利> VAPORIZER AND METHOD OF VAPORIZING AND CLEANING METHOD OF VAPORIZER HAVING HIGH EVAPORATING EFFICIENCY USING PLASMA

VAPORIZER AND METHOD OF VAPORIZING AND CLEANING METHOD OF VAPORIZER HAVING HIGH EVAPORATING EFFICIENCY USING PLASMA

机译:具有等离子体的高蒸发效率的蒸发器及其蒸发和清洁方法

摘要

A vaporizer, a vaporizing method, and a method for cleaning the vaporizer are provided to maximize operation efficiency of the vaporizer by generating plasma inside the vaporizer. A vaporizing unit(124) includes a source portion(100), a valve(110), and a vaporizer(120). A liquid source is contained in the source portion. The valve adjusts a flow rate of the liquid source in the source portion. The liquid source is vaporized, such that the liquid source is turned into a gas source in the source portion. The vaporizer sprays the gas source toward a wafer, such that a thin film is formed on the wafer. The vaporizer is composed of discharge cells, such that the vaporizer is discharged. The vaporizer includes a cylindrical ceramic vaporizer tube and an induction coil. A coil is wound around a tube-like vaporizer, such that the vaporizer generates plasma.
机译:提供一种蒸发器,一种蒸发方法以及一种用于清洁蒸发器的方法,以通过在蒸发器内部产生等离子体来最大化蒸发器的运行效率。汽化单元(124)包括源部(100),阀(110)和汽化器(120)。液体源包含在源部分中。阀调节源部中的液体源的流量。液体源被汽化,使得液体源在源部分中变成气体源。汽化器向晶片喷射气体源,从而在晶片上形成薄膜。蒸发器由放电室组成,使得蒸发器被排放。该蒸发器包括圆柱形陶瓷蒸发器管和感应线圈。线圈缠绕在管状蒸发器上,使得蒸发器产生等离子体。

著录项

  • 公开/公告号KR20080029346A

    专利类型

  • 公开/公告日2008-04-03

    原文格式PDF

  • 申请/专利权人 INTEGRATED PROCESS SYSTEMS LTD.;

    申请/专利号KR20060095292

  • 发明设计人 BAE JUN SUNG;LEE KI HOON;

    申请日2006-09-29

  • 分类号H01L21/02;H01L21/205;H01L21/3065;

  • 国家 KR

  • 入库时间 2022-08-21 19:53:56

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