ALKALI DEVELOPMENT TYPE PASTE COMPOSITION, METHOD FOR CONDUCTIVE PATTERN AND BLACK MATRIX PATTERN FORMATION USING THE SAME, AND THE CONDUCTIVE PATTERN AND THE BLACK MATRIX PATTERN

摘要

An alkali development type paste composition is provided to ensure high sensitivity to actinic energy rays and to be useful for forming a precise micropattern efficiently. An alkali development type paste composition includes (A) a carboxyl group-containing resin, (B) a glass frit, (C) an inorganic powder, (D) a compound having at least one radically polymerizable unsaturated group in a molecule, (E) an oxime-based photopolymerization initiator represented by the following formula 1, and (F) a sulfur compound represented by the following formula 2. In the formula 1, R^1 represents a hydrogen atom, C1-6 alkyl group, or phenyl group, R^2 represents a hydrogen atom or C1-6 alkyl group. In the formula 2, R^3 represents an alkyl group, aryl group, or substituted aryl group, R^4 represents a hydrogen atom or alkyl group, and R^3 and R^4 represent a non-metallic atom group and are bonded to each other to form a 5-membered to 7-membered ring with or without a hetero atom selected from oxygen, sulfur, and nitrogen atoms.