BASE FILM FOR PURPOSE TO MANUFACTURE FILM FOR IMPROVING CONTRAST RATIO AND METHOD FOR MANUFACTURING OF PATTERN FOR SHIELDING OUTLIGHT IN CONTRAST RATIO IMPROVEMENT FILM

摘要

A base film for manufacturing a contrast ratio improvement film and a method for manufacturing an external light shielding pattern in a contrast ratio improvement film are provided to prevent an electrostatic effect by forming the external light shielding pattern in a non-contact manner. A base film for manufacturing a contrast ratio improvement film includes a base film(600) and a self-color-changeable chromatophore. The self-color-changeable chromatophore is distributed in the base film. The self-color-changeable chromatophore is color-changed in response of a laser beam. The base film is composed of one or two or more materials selected from polyethylene terephthalate, polycarbonate, polyvinyl chloride, polyester, polymethylmethacrylate, polystyrene, polyestersulfon, polybutadiene, polyesterketone, and polyurethane.