SYNTHESIS APPARATUS AND METHOD FOR METAL COMPOUND STANDARD MIXTURE GAS AND PRETREATMENT METHOD OF METAL COMPOUND STANDARD MIXTURE GAS

摘要

A metal compound standard mixture gas producing apparatus and a method, and a metal compound standard mixture gas analysis and pretreatment method are provided to present a standard for analysis of metal impurities and metal harmful matter of the special gas by exactly analyzing the metal impurities or restricted materials. A metal compound standard mixture gas producing apparatus is composed of: a primary background gas supply source(10); a carrier gas supply source(11); two mass flow controllers(30,40) controlling the flow of the background gas and carrier gas supply fed from the primary background gas supply source and the carrier gas supply source; an evaporator(50) connected to the carrier gas mass flow controller to evaporate and dilute MOCVD(Metal Organic Chemical Vapor Deposition) and to make the diluted MOCVD flow; a mixer(60) connected to the primary background gas mass flow controller and the evaporator, respectively to mix the inflow background gas and MOCVD; a secondary background gas supply source(12); a buffer container(2) containing the secondary background gas flowing through the secondary background gas supply source and the mixture gas flowing through the mixer; a mixture gas container connected to the buffer container to receive the gas flowing from the buffer container; and a precise balance(130) connected to the mixture gas container to measure the weight of the background gas.