PHOTOMASK INSPECTION METHOD INCLUDING SEPARATED STEPS OF INSPECTING, REVIEWING AND REPAIRING PATTERNS, AND SYSTEMS AND REVIEWING SYSTEM FOR USING THE SAME

摘要

A photomask inspection method in which pattern inspection, a pattern checking and a pattern correction are separately performed is provided to improve productivity of a photomask by separately performing processes for inspecting, checking and correcting the pattern of a photomask. A photomask having an optical pattern on its one surface is fabricated(S10). The photomask is inspected by a first resolution in a photomask pattern inspecting system with the first resolution to extract the coordinates of the pattern defects of the photomask. The coordinates of the extracted defects are converted into coordinates data(S30). The coordinates data is transferred to a photomask pattern checking system with a second resolution better than the first resolution. In the photomask pattern checking system, the extracted defects are displayed on a monitor by the second resolution. The defects displayed on the monitor are classified according to their types(S40). Among the classified defects, defects that need to be corrected are converted into correction data. The correction data is transferred to a photomask pattern correcting system. The defects are corrected according to the correction data in the photomask pattern correcting system(S50). The corrected defects are checked in the photomask pattern checking system(S60). The photomask whose defects are corrected are finally inspected(S90).