method u0444u043eu0440u043cu0438u0440u043eu0432u0430u043du0438u00a0 u043cu0435u0436u0443u0440u043eu0432u043du0435u0432u043eu0439 u0438u0437u043eu043bu00a0u0446u0438u0438 integrated circuits of u0431u043eu0440u043eu0444u043eu0441u0444u043eu0440u043eu0441u0438u043bu0438u043au0430u0442u043du043eu0433u043e glass

摘要

method u0444u043eu0440u043cu0438u0440u043eu0432u0430u043du0438u00a0 u043cu0435u0436u0443u0440u043eu0432u043du0435u0432u043eu0439 u0438u0437u043eu043bu00a0u0446u0438u0438 integrated circuits of u0431u043eu0440u043eu0444u043eu0441u0444u043eu0440u043eu0441u0438u043bu0438u043au0430u0442u043du043eu0433u043e glass, comprising the silicon substrates with vin u0435u0433u0440u0430u043bu044cu043du044bu0445 schemes in reactor heated to 600 700u0441, u0432u0430u043au0443u0443u043cu0438u0440u043eu0432u0430u043du0438u0435 reactor, a separate file in the reactor vapors u0442u0435u0442u0440u0430u044du0442u043eu043au0441u0438u0441u0438u043bu0430u043du0430 with nitrogen or oxygen through the ex u0430u0440u0438u0442u0435u043bu00a0 - u0431u0430u0440u0431u043eu0442u0435u0440u0430 in 30 60u0441,u0444u043eu0441u0444u0438u043du0430 with pairs u0442u0440u0438u043cu0435u0442u0438u043bu0431u043eu0440u0430u0442u0430 in u0438u043du0435u0440u0442u043du043eu043c gas and oxygen, building glass film u0431u043eu0440u043eu0444u043eu0441u0444u043eu0440u043eu0441u0438u043bu0438u043au0430u0442u043du043eu0433u043e required thickness with phosphorus content of 2 to 5 mas.% b ora 3 - 6 mas.at a pressure of 15% - 100 pa and the ratio of ingredients of phosphine - oxygen more than or equal to 0.2 at a temperature of the heating reactor, the fusion of u0431u043eu0440u043eu0444u043eu0441u0444u043eu0440u043eu0441u0438u043bu0438u043au0430u0442u043du043eu0433u043e glass u0442u043bu0438u0447u0430u044eu0449u0438u0439u0441u00a0 so that, with a view to u043fu043eu0432u044bu0448u0435u043du0438u00a0 quality u043cu0435u0436u0443u0440u043eu0432u043du0435u0432u043eu0439 u0438u0437u043eu043bu00a0u0446u0438u0438 by u0441u043du0438u0436u0435u043du0438u00a0 deficiency and u043fu043eu0432u044bu0448u0435u043du0438u00a0 stability of glass in timeafter u043du0430u0440u0430u0449u0438u0432u0430u043du0438u00a0 u0431u043eu0440u043eu0444u043eu0441u0444u043eu0440u043eu0441u0438u043bu0438u043au0430u0442u043du043eu0433u043e glass film of required thickness have an u0442u0440u0438u043cu0435u0442u0438u043bu0431u043eu0440u0430u0442u0430 u0438u043du0435u0440u0442u043du043eu043c vapour in gaza and besieged by the protective layer column noah 0.02 0.1 microns without u0438u0437u043cu0435u043du0435u043du0438u00a0 temperature reactor and u0434u0430u0432u043bu0435u043du0438u00a0, and before u043eu043fu043bu0430u0432u043bu0435u043du0438u0435u043c u0443u0434u0430u043bu00a0u044eu0442 protective layer selectively to the tape u0431u043eu0440u043eu0444u043eu0441u0444u043eu0440u043eu0441u0438u043bu0438u043au0430u0442u043du043eu0433u043e glass.