Substrate's i.e. embossing matrix, surface structure producing method for e.g. manufacturing decorative pattern, involves applying surface reliefs, and forming impression of substrate before formation of production unit

摘要

The method involves applying surface reliefs for realization of diffractive characteristics in surface sections (2, 3) of a substrate (1). A photolithographic technique is utilized for formation of a part of one of the surface sections. A photoresist e.g. positive photoresist, is applied on the substrate, and exposed and processed via a photomask over entire layer thickness. An exposed part or a non-exposed part of the photoresist is subsequently removed. An impression of the substrate is formed before formation of a production unit. An independent claim is also included for an embossing matrix comprising a surface structure.