首页> 外国专利> Projection objective for microlithographic projection exposure apparatus, has lens composed of lens elements which are arranged to follow each other along optical axis, where lens has curved lens surfaces put together by elements

Projection objective for microlithographic projection exposure apparatus, has lens composed of lens elements which are arranged to follow each other along optical axis, where lens has curved lens surfaces put together by elements

机译:用于微光刻投影曝光设备的投影物镜,具有由透镜元件组成的透镜,这些透镜元件沿光轴彼此跟随布置,其中透镜具有由元件组合在一起的弯曲透镜表面

摘要

The objective has a lens (143) composed of a set of lens elements (143a-143d), which are arranged to follow each other along an optical axis (OA) in a mutually adjacent relationship. The lens has a set of curved lens surfaces put together by the lens elements made of intrinsically birefringent material e.g. magnesium spinel. The lens elements are made up of two pairs of lens elements having crystallographic cuts different from each other. The lens elements of each pair have same crystallographic cut and are arranged relative to each other with a rotary offset about the optical axis. Independent claims are also included for the following: (1) a microlithographic projection exposure apparatus with an illumination device (2) a method for microlithographic manufacture of microstructured components.
机译:物镜具有由一组透镜元件(143a-143d)组成的透镜(143),这些透镜元件被布置为沿光轴(OA)以彼此相邻的关系彼此跟随。该透镜具有一组弯曲的透镜表面,该透镜表面由由固有双折射材料例如玻璃制成的透镜元件放在一起。镁尖晶石。透镜元件由晶体学切割彼此不同的两对透镜元件组成。每对的透镜元件具有相同的晶体学切口,并且相对于彼此以绕光轴的旋转偏移布置。还包括以下方面的独立权利要求:(1)具有照明装置的微光刻投影曝光设备(2)一种微光刻制造微结构部件的方法。

著录项

  • 公开/公告号DE102006038398A1

    专利类型

  • 公开/公告日2008-02-21

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20061038398

  • 发明设计人 KRAEHMER DANIEL;RUOFF JOHANNES;

    申请日2006-08-15

  • 分类号G02B13/14;G02B3;G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:47

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