Exposing station for producing differently structured regions in a photo-alignment layer for liquid crystalline materials comprises an ultraviolet radiation source, a polarization device and a mask device

摘要

Exposing station (10) comprises an ultraviolet radiation source (20) for exposing a carrier (14) provided with a photo-alignment layer (12), a polarization device (30) arranged between the radiation source and the layer and a mask device arranged in the radiation path between the polarization device and the layer to expose the layer with linear polarized ultraviolet radiation. An independent claim is also included for a method for the production of differently structured regions in a photo-alignment layer for liquid crystalline materials using the above exposing station. Preferred Features: The polarization device has a first reflector plate with an absorption layer for absorbing radiation not for the exposing process.