首页> 外国专利> Semiconductor component e.g. bipolar transistor, has charge carrier compensation zone between drift zone and connection zone, where doping concentration of charge carrier compensation zone is greater than concentration of connection zone

Semiconductor component e.g. bipolar transistor, has charge carrier compensation zone between drift zone and connection zone, where doping concentration of charge carrier compensation zone is greater than concentration of connection zone

机译:半导体元件双极晶体管,在漂移区和连接区之间具有电荷载流子补偿区,其中载流子补偿区的掺杂浓度大于连接区的浓度

摘要

The semiconductor component has a drift zone (12) weakly doped as a connection zone (11). A component transition is provided between the drift zone and a component zone (14), and a charge carrier compensation zone (13) is provided between the drift zone and the connection zone. Doping concentration of the charge carrier compensation zone is greater than doping concentration of the connection zone. The doping concentration of the connection zone increases towards the connection zone from a minimal doping concentration to a maximum doping concentration.
机译:半导体部件具有弱掺杂的漂移区(12)作为连接区(11)。在漂移区和部件区(14)之间提供了一个组分过渡区,并且在漂移区和连接区之间提供了电荷载流子补偿区(13)。载流子补偿区的掺杂浓度大于连接区的掺杂浓度。连接区的掺杂浓度从最小掺杂浓度向最大掺杂浓度向连接区增加。

著录项

  • 公开/公告号DE102006046845A1

    专利类型

  • 公开/公告日2008-04-03

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AUSTRIA AG;

    申请/专利号DE20061046845

  • 发明设计人 SCHULZE HANS-JOACHIM;LUTZ JOSEF;

    申请日2006-10-02

  • 分类号H01L29/861;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:42

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