首页> 外国专利> Wafer-carrier arrangement for use during manufacturing e.g. diode, has carrier layer system with carrier layer, where adhesive strength between system and separation layer is greater than adhesive strength between wafer and separation layer

Wafer-carrier arrangement for use during manufacturing e.g. diode, has carrier layer system with carrier layer, where adhesive strength between system and separation layer is greater than adhesive strength between wafer and separation layer

机译:在制造过程中使用的晶片载体装置,例如二极管,具有带有载体层的载体层系统,其中系统与分离层之间的粘合强度大于晶片与分离层之间的粘合强度

摘要

The arrangement has a plasma polymer separation layer (4) that is arranged between a carrier layer system and a wafer (1). The carrier layer system comprises a carrier layer (6), a plasma polymer layer and a hardened layer (5) that is made of a hardened elastomer material on a side of the separation layer. Adhesive strength between the carrier layer system and the separation layer is greater than the adhesive strength between the wafer and the separation layer. A connection material layer is provided on a side of the wafer, and another carrier layer has a foil. Independent claims are also included for the following: (1) an application of a layer from hardened elastomer material, a plasma polymer separation layer and/or a carrier layer system (2) a method for manufacturing a layer system (3) a method for manufacturing a wafer-carrier arrangement (4) a method for processing a rear side of a wafer.
机译:该装置具有布置在载体层系统和晶片(1)之间的等离子体聚合物分离层(4)。载体层系统在分离层的一侧上包括载体层(6),等离子体聚合物层和由硬化的弹性体材料制成的硬化层(5)。载体层系统与分离层之间的粘合强度大于晶片与分离层之间的粘合强度。在晶片的侧面上提供连接材料层,并且另一载体层具有箔。还包括以下方面的独立权利要求:(1)从硬化的弹性体材料,等离子聚合物分离层和/或载体层系统施加层(2)制造层系统的方法(3)制造晶片载体装置(4)的方法是处理晶片的背面。

著录项

  • 公开/公告号DE102006048800A1

    专利类型

  • 公开/公告日2008-04-17

    原文格式PDF

  • 申请/专利权人 JAKOB ANDREAS;

    申请/专利号DE20061048800

  • 发明设计人 JAKOB ANDREAS;

    申请日2006-10-16

  • 分类号H01L21/67;H01L21/304;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:38

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