首页> 外国专利> Connection structure for e.g. vertical FET, has electrode connected with connecting structure of potential, another electrode connected with connecting structure of another potential, and trenches running on edge area

Connection structure for e.g. vertical FET, has electrode connected with connecting structure of potential, another electrode connected with connecting structure of another potential, and trenches running on edge area

机译:例如的连接结构垂直FET,其电极与电位的连接结构连接,另一个电极与另一个电位的连接结构连接,并且沟槽在边缘区域延伸

摘要

The connection structure has electrodes arranged in the same electrode level and correspond to a main surface of a substrate of an electronic component (100) e.g. vertical FET. One of the electrodes is provided at an edge area-sided end of a trench (130) and extends beyond the other electrode at an edge area-sided end of another trench (230). The former electrode is connected with a connecting structure (110) of a potential, and the latter electrode is connected with a connecting structure (210) of another potential. The trenches run on an edge area.
机译:该连接结构具有布置在相同电极水平上并对应于例如电子部件(100)的基板的主表面的电极。垂直场效应管。电极之一设置在沟槽(130)的边缘区域侧的端部处,并且在另一沟槽(230)的边缘区域侧的端部处延伸超过另一电极。前电极与电位的连接结构(110)连接,后电极与另一电位的连接结构(210)连接。沟槽在边缘区域上延伸。

著录项

  • 公开/公告号DE102006056809B3

    专利类型

  • 公开/公告日2008-05-21

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AUSTRIA AG;

    申请/专利号DE20061056809

  • 发明设计人 ZUNDEL MARKUS;HIRLER FRANZ;

    申请日2006-12-01

  • 分类号H01L29/417;H01L29/78;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:36

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