Single crystal silicon drawing apparatus, method for preventing the contamination of silicon melt, and apparatus for preventing the contamination of silicon melt

摘要

Single crystal silicon drawing device comprises, in a furnace, a cylindrical body, which surrounds a pulling path of a single crystal silicon, and a thermal shielding body, which surrounds the cylindrical body, wherein the single crystal silicon drawing the single crystalline silicon upward, whereas it is a gas from an upper part to a lower part in the furnace, wherein the pulling path of the single crystal silicon, the cylindrical body and the thermal shielding body are arranged so that a speed of a gas flow, which between a lower end of the cylindrical body and the thermal shielding body, to a speed is set, in the case of the dust on the silicon melt is prevented from falling onto the.