首页> 外国专利> Method for interference distance measurement of object, involves guiding radiation emitted by radiation sources over transparent substrate and radiation is guided by partial silvering on its rear side in measuring beam and reference beam

Method for interference distance measurement of object, involves guiding radiation emitted by radiation sources over transparent substrate and radiation is guided by partial silvering on its rear side in measuring beam and reference beam

机译:用于测量物体的干涉距离的方法,包括将辐射源发出的辐射引导到透明基板上,并通过在测量光束和参考光束的背面进行部分镀银来引导辐射

摘要

The method involves guiding radiation (6) emitted by a radiation source (5) over a transparent substrate. The radiation is guided by a partial silvering on its rear side in a measuring beam (8) and a reference beam (9). The measuring beam is reflected on the object to be measured and the reference beam is reflected on the partial silvering. The reference beam is guided by multiple reflections on or in the substrate depending on the distance position of the object from the substrate and depending on the thickness of the substrates. An independent claim is also included for a device for interference distance measurement of objects.
机译:该方法包括将由辐射源(5)发射的辐射(6)引导到透明基板上。辐射通过在测量光束(8)和参考光束(9)背面的部分镀银来引导。测量光束在待测物体上反射,参考光束在部分镀银上反射。取决于物体到基板的距离位置以及取决于基板的厚度,参考光束由基板上或基板中的多次反射引导。还包括用于对象的干扰距离测量的设备的独立权利要求。

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