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Optical component used in micro-lithographic exposure and projection systems for producing highly integrated circuits consists of synthetic quartz glass containing hydroxyl groups and chemically bound nitrogen
Optical component used in micro-lithographic exposure and projection systems for producing highly integrated circuits consists of synthetic quartz glass containing hydroxyl groups and chemically bound nitrogen
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机译:微光刻曝光和投影系统中用于生产高度集成电路的光学组件由含有羟基和化学键合氮的合成石英玻璃组成
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摘要
Optical component consists of synthetic quartz glass containing 1-60 ppm hydroxyl groups and chemically bound nitrogen. An independent claim is also included for a method for the production of synthetic quartz glass.
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