Projection optics for use in microlithography, has reflection surface of curved mirror configured as static free-form surface, where intersection of optical axis of refractive subunit with object plane is located in object field

摘要

The optics has a reflection surface of a curved mirror configured as a static free-form surface. The intersection of an optical axis (26) of a refractive subunit with an object plane (4) is located in the object field. The intersection of the optical axis of the refractive subunit with the object plane is centered in the object field. The intersection of the optical axis of the refractive subunit with the image plane is located in the image field. The mirror is deformable in a region of a pupil plane (22) of the projection optics. Independent claims are also included for the following: (1) a projection exposure system comprising an illumination optics (2) a method for producing a microstructured element.