A method for designing an illumination source, a method for designing a mask structure, to a process for producing a photomask, a method for fabricating a semiconductor device and computer program product

摘要

PROBLEM TO BE SOLVED: To provide the designing method of an illumination light source that can make a degree of light exposure margin optimal.;SOLUTION: The designing method of an illumination light source comprises steps of setting a management figure to be used for dimensional control of the transfer pattern of a mask pattern, setting a plurality of lighting elements for lighting the mask pattern, setting a first illumination light to a first polarized state of the light emitted from each of the plurality of illumination elements, calculating a first optical image of the management figure formed on a first imaging surface by each of the first illumination lights, and determining an illumination shape of light and a polarized state distribution based on the optical characteristics of the first optical image.;COPYRIGHT: (C)2006,JPO&NCIPI